Publications
CTA believes that publishing the results of research and development strengthens the image of its clients and their products. As a third party with a solid reputation for rigorous work, CTA brings added credibility to product research. Client authorship or acknowledgement is included in all papers and presentations.
Chemical Delivery
- Effects of Pump Pulsation on Membrane Filter Retention (2005)
- Qualification of chemical delivery systems for elemental extraction using the dynamic extraction technique (1996)
- Delivery of high purity chemicals for the manufacture of semiconductor microcircuits with sub-0.5 μm geometries (1996)
- Methodology for Reducing Process Variability through In-Situ Production of Positive Photoresist Developer (1995)
- Calibrating Flowmeters for Use in Measuring Contamination in High-Purity Process Liquids (1995)
- Design, Certification and Verification of Technology for Delivering Sub-ppb, Low-Particle Chemicals to Semiconductor Cleaning Baths in Wafer Fabs (1994)
- The Effect of Operational Mode on Particle Concentrations in Bulk Chemical Delivery Systems (1991)
- Measurement of Particle Concentrations In Central Chemical Delivery Systems (1990)
Collodial Dispersions
- A New Method for Determining the Size Distribution of Particles in CMP Slurries (2010)
- Susceptibility of Different Slurry Types to Agglomeration (2009)
- A new method for determining the size distribution of particles in colloidal suspensions (2008)
- Effects of Shear and Cavitation on Particle Agglomeration During Handling of Cmp Slurries Containing Silica, Alumina, and Ceria Particles (2007)
- Effects of Pump Pulsation and Particle Loading on Membrane Filter Retention (2006)
- Effect of a Maglev Centrifugal Pump on Slurry Health and Defect Rates (2005)
- Effect of Particle Size Distribution on Filter Lifetime in Three Slurry Pump Systems (2005)
- Effects of Fluid Handling Components on Slurry Health (2005)
- Effect of Shear Stress and the Influence of Different Pump Methods on CMP Slurry (2004)
- Analysis of Wafer Defects Caused By Large Particles IN CMP Slurry Using Light Scattering and SEM Measurement (2003)
- Measuring Particles in CMP Slurries (2001)
- Characterization of Circulated Chemical-Mechanical Polishing Slurry Particles Using Two Analysis Methods (2001)
- Comparison Of Instruments Used For Measuring Concentrations of Large Particles (≥ 1 μm) in CMP Slurry (2000)
Contamination Control
- Evaluation of Particle Shedding and Trace Metal Extraction of Four Centrifugal Pumps (2011)
- Measurement of 28 nm particle removal from liquids by high purity filters (2010)
- A “New” Method for Measuring 20nm Particles in Ultrapure Water (2009)
- A High Flow Filter for UPW Applications – A Field Case Study (2009)
- Susceptibility of Different Slurry Types to Agglomeration (2009)
- Qualification of components for high purity water, chemical and slurry systems. (2008)
- Evaluation of Particle Shedding and Trace Metal Extraction from High Purity Pumps (2008)
- Effects of Shear and Cavitation on Particle Agglomeration During Handling of Cmp Slurries Containing Silica, Alumina, and Ceria Particles (2007)
- Effects of Pump Pulsation and Particle Loading on Membrane Filter Retention (2006)
- Effect of Particle Size Distribution on Filter Lifetime in Three Slurry Pump Systems (2005)
- Effects of Fluid Handling Components on Slurry Health (2005)
- Effect of a Maglev Centrifugal Pump on Slurry Health and Defect Rates (2005)
- Effects of Pump Pulsation on Membrane Filter Retention (2005)
- Analysis of Wafer Defects Caused By Large Particles IN CMP Slurry Using Light Scattering and SEM Measurement (2003)
- The anticipated behavior of bubbles in semiconductor process liquids (2003)
- Testing Components Used in Semiconductor Liquid- Handling Systems to Assure Product Purity and Reliability (2001)
- Testing liquid-handling system components to ensure purity and reliability (2001)
- Measuring Particles in CMP Slurries (2001)
- Characterization of Circulated Chemical-Mechanical Polishing Slurry Particles Using Two Analysis Methods (2001)
- Comparison Of Instruments Used For Measuring Concentrations of Large Particles (≥ 1 μm) in CMP Slurry (2000)
- Comparison of Optical Particle Sensors Used to Measure Particle Concentrations in High-Purity Chemicals Phase I - Sensor comparison in water (1999)
- Comparison of Optical Particle Sensors Used to Measure Particle Concentrations in High-Purity Chemicals: Phase II – Sensor Comparison in Chemicals (1999)
- The Effect of Fluid Dynamics on Particle Shedding from Semiconductor Fluid-Handling Components (1998)
- Purity Control in Dilute HF Baths Using Point-of-Use Purification (1997)
Filtration
- Measuring sub-50nm particle retention of UPW filters. (2011)
- Measurement of 28 nm particle removal from liquids by high purity filters (2010)
- A High Flow Filter for UPW Applications – A Field Case Study (2009)
- Effects of Pump Pulsation and Particle Loading on Membrane Filter Retention (2006)
- Neutral adsorptive capture of particles by membranes: network modeling near the membrane isoelectric point (2004)
- Optimization of Filter Properties for Recirculating Etch Baths (2000)
- Filtration of Sulfuric Acid Using Polyethylene Filters (1997)
- A Method for Comparing the Performance of Filters Used in Semiconductor Liquid Purification Applications (1994)
- Predicting the Performance Efficiency of Membrane Filters in Process Liquids Based on Their Pore-Size Ratings (1991)
- Modelling of Particle Removal from a Circulating Etch Bath (1990)
- Particle Capture Mechanisms in Gases and Liquids: An Analysis of Operative Mechanisms in Membrane/Fibrous Filters (1989)
Particles in High Purity Liquids
- Measurement of 28 nm particle removal from liquids by high purity filters (2010)
- A “New” Method for Measuring 20nm Particles in Ultrapure Water (2009)
- A Proposal for Measuring 20-nm Particles in High-Purity Water Using a New Technology (2009)
- A High Flow Filter for UPW Applications – A Field Case Study (2009)
- New Real-Time Technique to Measure the Size Distribution of Water-Insoluble Aerosols (2005)
- Methodology for Reducing Process Variability through In-Situ Production of Positive Photoresist Developer (1995)
Performance and Reliability
- Modeling of Component Lifetime Based on Accelerated Life Tests and Gas Permeation Measurements (2011)
- The effect of HCl permeation through PFA on expected component life (2008)
- Resolution of permeation issues in liquid handling systems (2003)
- Testing Components Used in Semiconductor Liquid- Handling Systems to Assure Product Purity and Reliability (2001)
- Testing liquid-handling system components to ensure purity and reliability (2001)
- Generation and recovery of high purity water used during the manufacture of semiconductor process equipment (1996)
Permeation and Diffusion
- Modeling of Component Lifetime Based on Accelerated Life Tests and Gas Permeation Measurements (2011)
- The effect of HCl permeation through PFA on expected component life (2008)
- Resolution of permeation issues in liquid handling systems (2003)
Trace Metal Extraction
- The Extraction of Surface and Bulk Trace Metal Impurities from Typical Fluoropolymers (1998)
- Measurement of Inorganic Contaminant Extraction from Fluid Handling Components by Dynamic Extraction (1996)
- Measurement of Inorganic Contaminant Extraction from Fluid Handling Components by Dynamic Extraction (1995)
- Dynamic Extraction: A New Technique For Measuring Metallic Extractables From Chemical Handling System Components (1995)