• Class 100 clean room space with full chemical handling capabilities
• Semiconductor-grade ultrapure water facility
• 7 liquid particle counters
• A variety of basic analytical instruments
• Close ties with analytical laboratories that provide sophisticated analytical services such as ICP-MS, GFAAS, and GC-MS as well as SIMS, SEM, and AFM.

• Helped reduce particle specifications for chemical delivery systems from more than 100/ml (> 0.5 µm diameter) to less than 1/ml (> 0.1 µm diameter).
• Evaluated responses of particle counters with different optical benches to naturally occurring particles in process chemicals.

• Developed a procedure to measure the rates at which ionic contaminants are extracted from high-purity parts by high-purity acids (sensitive to 0.01 ng/cm²/day).
• Developed QC procedures and specifications for particles, organics, and inorganics released from components (valves, tubing, fittings, pumps, regulators, etc.) for use in liquid-handling systems.

• Developed filter management techniques to provide low particle concentrations in high-purity chemicals.
• Compared the efficacy of different filters for obtaining low particle concentrations in ultrahigh-purity chemicals.

• Developed techniques to measure the permeation rates of gases and liquids through polymers.
• Developed computer models to predict the non-steady-state transport of gases and liquids through polymers.

• Developed a patent-pending technique for measuring liquid surface tension.
• Developed proprietary techniques to prepare particle count standards.

• Comparison of optical particle sensors used to measure particle concentrations in high purity chemicals - #33 and #34
• Evaluating a novel liquid-borne particle counter based on interferometry - #9
• Measurement of particle concentrations in central chemical delivery system - #2 and #3
• The effect of wafer scanner accuracy on the determination of wafer cleaning equipment particles per wafer pass - #7

• Particle capture mechanisms in gases and liquids: An analysis of operative mechanisms - #1
• A method of comparing the performance of filters used in semiconductor liquid purification applications - #11
• Predicting the performance of membrane filters in process liquids based on their pore size rating - #5
• Modelling of particle removal from a recirculating etch bath - #4
• Filtration of sulfuric acid using polyethylene filters - #29

Contamination Control

• The extraction of surface and bulk trace metal impurities from typical fluoropolymers - #32
• The effect of fluid dynamics on particle shedding from semiconductor fluid-handling components - #44
• Control of chemical purity in wafer processing baths - #30
• Measurement of inorganic contaminant extraction from fluid handling components by dynamic extraction - #22
• Specification and verification of metallic extractables in fluid handling components - #27
• Issues involved in qualifying chemical delivery systems for metallic extractables - #10

Miscellaneous

• Calibrating flowmeters for use in measuring contamination in high purity process fluids - #20
• Methodology for reducing process variability through in-situ production of positive photoresist developer - #18
• Wet chemical processes: Cleaning processes based on aqueous solutions - #6